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K. Tsutsumi
K. Tsutsumi
Toshiba
Analytical chemistry
Ferroelectricity
Ferroelectric RAM
Sputtering
Materials science
4
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8
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Chemical dry cleaning technology for reliable 65 nm CMOS contact to NiSi/sub x/
2005
IITC | International Interconnect Technology Conference
Makoto Honda
K. Tsutsumi
Hideaki Harakawa
A. Nomachi
Kazuhiro Murakami
K. Ooya
T. Kudou
Takahito Nagamatsu
Hirokazu Ezawa
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Characteristics of an Oxygen Barrier Based on Bi-layered Ir
2003
Integrated Ferroelectrics
Bum Ki Moon
Osamu Arisumi
Rainer Bruchhaus
K. Tsutsumi
Hiroshi Itokawa
Karl Hornik
T. Tsuchiya
Andreas Hilliger
Jingyu Lian
C. U. Pinnow
T. Ozaki
Iwao Kunishima
Nicolas Nagel
Koji Yamakawa
Gerhard Beitel
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Development of stable PZT sputtering process using ex-situ crystallization and PZT/Pt interface control technique
1998
ISAF | International Symposium on Applications of Ferroelectrics
Koji Yamakawa
Osamu Arisumi
K. Okuwada
K. Tsutsumi
T. Katata
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Citations (6)
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