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Takara Kato
Takara Kato
Materials science
Chemical vapor deposition
Metallurgy
Electrical resistivity and conductivity
Copper
3
Papers
19
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Bottom up deposition of advanced iPVD Cu process integrated with iPVD Ti and CVD Ru
2012
Microelectronic Engineering
Tadahiro Ishizaka
Takashi Sakuma
Masaya Kawamata
Osamu Yokoyama
Takara Kato
Atsushi Gomi
Chiaki Yasumuro
Hiroyuki Toshima
Toshihiko Fukushima
Yasushi Mizusawa
Tatsuo Hatano
Masamichi Hara
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Citations (14)
Cu dry-fill on CVD Ru liner for advanced gap-fill and lower resistance
2011
IITC | International Interconnect Technology Conference
Tadahiro Ishizaka
A. Gomi
Takara Kato
Takashi Sakuma
Osamu Yokoyama
C. Yasumuro
H. Toshima
Yasushi Mizusawa
Tatsuo Hatano
Cheonsoo Han
Masamichi Hara
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Citations (4)
Bottom up deposition of advanced iPVD Cu process integrated with iPVD Ti and CVD Ru
2010
Tadahiro Ishizaka
Takashi Sakuma
Masaya Kawamata
Osamu Yokoyama
Takara Kato
Gomi Atsushi
Chiaki Yasumuro
Hiroyuki Toshima
Toshihiko Fukushima
Yasushi Mizusawa
Tatsuo Hatano
Masamichi Hara
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Citations (1)
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