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Brian S. Freer
Brian S. Freer
Axcelis Technologies
Ion implantation
Analytical chemistry
Beam (structure)
Ion
Materials science
6
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8
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Low-Energy Ion Implantation Using the Arsenic Dimer Ion: Process Characterization and Throughput Improvement
2005
Journal of The Electrochemical Society
Peter Miltiadis Kopalidis
Brian S. Freer
Mark Rathmell
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Citations (1)
In situ beam angle measurement in a multi-wafer high current ion implanter
2005
Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms
Brian S. Freer
R.N. Reece
Michael A. Graf
Thomas Parrill
D. Polner
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Mass resolution: The effects of resolving aperture and beam width on beam current and energetic contamination
2005
Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms
Brian S. Freer
Michael A. Graf
J.L. Chow
Daniel R. Tieger
C. Sohl
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Ion beam input angle detector for ion implantation systems
2004
Ronald Reese
Michael A. Graf
Thomas Parrill
Brian S. Freer
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Low energy implant throughput improvement by using the Arsenic dimer ion (As 2 + ) on the Axcelis GSDIII/LED ion implanter
2002
Peter Miltiadis Kopalidis
C. Sohl
Brian S. Freer
M. Arneen
R. Reece
M. Rathmell
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Germanium operation on the GSDIII/LED and ultra high current ion implanters
2002
Brian S. Freer
Hans Rutishauser
Daniel R. Tieger
Michael A. Graf
Meela Stone
Alex S. Perel
Hiroshi Matsushita
Hiroyuki Muto
Mitsuaki Kabasawa
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