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M. Huang
M. Huang
Motorola
Gate dielectric
Electronic engineering
High-κ dielectric
Metal gate
Silicon on insulator
3
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34
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International Planetary Data Alliance (IPDA) Information Model
2007
John Steven Hughes
R. F. Beebe
Edward A. Guinness
David J. Heather
M. Huang
Y. Kasaba
Pedro Osuna
E. Rye
V. Savorskiy
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Performance and reliability of sub-100nm TaSiN metal gate fully-depleted SOI devices with high-k (HfO/sub 2/) gate dielectric
2004
VLSIT | Symposium on VLSI Technology
A.V.-Y. Thean
Anne Vandooren
S. Kalpat
Y. Du
I. To
J. Hughes
T. Stephens
B. Goolsby
Ted R. White
Alex Barr
Leo Mathew
M. Huang
S. Egley
M. Zavala
D. Eades
K. Sphabmixay
J. Schaeffer
Dina H. Triyoso
M. Rossow
D. Roan
Daniel Thanh-Khac Pham
Raj Rai
S. Murphy
Billy Nguyen
B.E. White
A. Duvallet
Thuy B. Dao
J. Mogab
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Mixed-signal performance of sub-100nm fully-depleted SOI devices with metal gate, high K (HfO/sub 2/) dielectric and elevated source/drain extensions
2003
IEDM | International Electron Devices Meeting
Anne Vandooren
Aaron Thean
Y. Du
I. To
J. Hughes
Tab A. Stephens
M. Huang
S. Egley
M. Zavala
K. Sphabmixay
Alex Barr
Ted R. White
Srikanth B. Samavedam
Leo Mathew
J. Schaeffer
Dina H. Triyoso
M. Rossow
D. Roan
Daniel Thanh-Khac Pham
Raj Rai
Bich Yen Nguyen
B.E. White
Marius K. Orlowski
A. Duvallet
Thuy B. Dao
J. Mogab
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Citations (27)
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