author-photo

Bin Zhang

Business International Corporation

5

Papers

5

Citations

Citation Trend

Filter By

Papers (5) Sort By

Journal Conference Others

Flowable CVD Process Application for Gap Fill at Advanced Technology

2014
Show All
- Source
- Cite
- Save
Citations (4)
Siconi Process Applications Study for 28nm Technology Node and Beyond

2014
Show All
- Source
- Cite
- Save
Citations (1)
Process Optimization of Dielectric CVD Film for Patterning Related Defect Reduction at 28nm Technology

2013
Show All
- Source
- Cite
- Save
Citations (0)
A High-Quality Spacer Oxide Formation for 28nm Technology Node and Beyond

2012 CSTIC | China Semiconductor Technology International Conference
Show All
- Source
- Cite
- Save
Citations (0)
Thin Film Challenges in 28nm Technology Node

2012 CSTIC | China Semiconductor Technology International Conference
Show All
- Source
- Cite
- Save
Citations (0)