author-photo

Ziying Zhang

Semiconductor Manufacturing International Corporation

9

Papers

24

Citations

Citation Trend

Filter By

Papers (5) Sort By

Journal Conference Others

14nm metal gate film stack development and challenges

2017 CSTIC | China Semiconductor Technology International Conference
Show All
- Source
- Cite
- Save
Citations (6)
An optimized W process for metal gate electrode gap filling application

2015 CSTIC | China Semiconductor Technology International Conference
Show All
- Source
- Cite
- Save
Citations (2)
HKMG All Last to Meet 20nm Logic Device Challenge

2013
Show All
- Source
- Cite
- Save
Citations (1)
Thin Film Challenges in 28nm Technology Node

2012 CSTIC | China Semiconductor Technology International Conference
Show All
- Source
- Cite
- Save
Citations (0)
Advanced HDP STI Gap-Fill Development in 65nm Logic Device

2010 CSTIC | China Semiconductor Technology International Conference
Show All
- Source
- Cite
- Save
Citations (2)