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Yang Hui Xiang

Business International Corporation

5

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1

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Siconi Process Applications Study for 28nm Technology Node and Beyond

2014
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Process Optimization of Dielectric CVD Film for Patterning Related Defect Reduction at 28nm Technology

2013
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A High-Quality Spacer Oxide Formation for 28nm Technology Node and Beyond

2012 CSTIC | China Semiconductor Technology International Conference
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Thin Film Challenges in 28nm Technology Node

2012 CSTIC | China Semiconductor Technology International Conference
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A Study of SiCN Cap Process Resultant Plasma Induced Damage in 40nm Technology Node

2012 CSTIC | China Semiconductor Technology International Conference
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