Old Web
English
Sign In
Acemap
>
authorDetail
>
Emad Aqad
Emad Aqad
Materials science
Extreme ultraviolet lithography
Resist
Analytical chemistry
Optoelectronics
5
Papers
15
Citations
0.00
KQI
Citation Trend
Filter By
Interval:
1900~2024
1900
2024
Author
Papers (4)
Sort By
Default
Most Recent
Most Early
Most Citation
No data
Journal
Conference
Others
Utilizing Roughness Power Spectral Density Variables to Guide Resist Formulation and Understand Impact of Frequency Analysis through Process
2018
Journal of Photopolymer Science and Technology
Charlotte Cutler
Choong-Bong Lee
James W. Thackeray
Chris A. Mack
John Nelson
Jason DeSisto
Mingqi Li
Emad Aqad
Xisen Hou
Tomas Marangoni
Joshua Kaitz
Rochelle Rena
Show All
Source
Cite
Save
Citations (2)
Photoacid generators, resist, comprising the photoacid generator, and coated article comprising these
2013
Emad Aqad
Irvinder Kaur
Cong Liu
Cheng Bai Xu
Mingqi Li
Gregory P. Prokopowicz
Show All
Source
Cite
Save
Citations (0)
Polymer-Bound PAGs for EUV Lithography
2010
CSTIC | China Semiconductor Technology International Conference
James W. Thackeray
Emad Aqad
Su Jin Kang
Kathleen Spear-Alfonso
Show All
Source
Cite
Save
Citations (1)
Design of Faster High Resolution Resists: Getting More Acid Yield from EUV Photons
2008
Journal of Photopolymer Science and Technology
James W. Thackeray
Emad Aqad
Michael F. Cronin
Kathaleen Spear-Alfonso
Show All
Source
Cite
Save
Citations (9)
1