author-photo

Chris A. Mack

KLA-Tencor
SEMATECH

251

Papers

2771

Citations

Citation Trend

Filter By

Papers (186) Sort By

Journal Conference Others

Measuring and analyzing contact hole variations in EUV lithography

2021
Show All
- Source
- Cite
- Save
Citations (0)
Pattern roughness analysis using power spectral density: application and impact in photoresist formulation

2021
Show All
- Source
- Cite
- Save
Citations (0)
Performance of stacked nanosheet gate all around FET’s with EUV patterned gate and sheets

2021
Show All
- Source
- Cite
- Save
Citations (1)
Line width roughness reduction strategies utilizing power spectral density analysis (Conference Presentation)

2020
Show All
- Source
- Cite
- Save
Citations (0)
A toast to Lithography's past: what we learned from technologies not used in HVM (Conference Presentation)

2020
- Chris A. Mack
- Harry J. Levinson
Show All
- Source
- Cite
- Save
Citations (0)
Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch

2020 Journal of Micro-nanolithography Mems and Moems
Show All
- Source
- Cite
- Save
Citations (1)
Guest Editorial: A Transition for JM3

2020 Journal of Micro-nanolithography Mems and Moems
- Chris A. Mack
Show All
- Source
- Cite
- Save
Citations (0)
Comparing edge detection algorithms: their impact on unbiased roughness measurement precision and accuracy

2020
- Chris A. Mack
Show All
- Source
- Cite
- Save
Citations (1)
Roughness Power Spectral Density as a Function of Aerial Image and Basic Process / Resist Parameters

2020 Journal of Photopolymer Science and Technology
Show All
- Source
- Cite
- Save
Citations (1)
Translations in JM3

2019 Journal of Micro-nanolithography Mems and Moems
- Kenji Yamazoe
- Chris A. Mack
Show All
- Source
- Cite
- Save
Citations (0)