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M.F. Carazzolne
M.F. Carazzolne
Materials science
Silicon
Annealing (metallurgy)
Thin film
X-ray crystallography
3
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Improvement of the thermal stability of the HfO 2 /Si(100) system using a diffusion barrier
2007
D. Weier
M. Schuermann
C. Fluechter
C. Westphal
A. de Sievro
R. Landers
M.F. Carazzolne
A. Pancotti
George G. Kleiman
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Investigation of the system hafnium/silicon(100) by means of XPS and X-ray photoelectron diffraction (XPD)
2006
C. Fluechter
D. Weier
U. Berges
Carsten Westphal
S. Dreiner
M. Schuermann
E. Henschel
M.F. Carazzolne
A. de Siervo
Richard Landers
George G. Kleiman
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XPS and XPD studies on the system hafnium(oxide) on Si(100) using soft X-rays
2006
D. Weier
C. Fluechter
U. Berges
C. Westphal
S. Dreiner
M. Schuermann
E. Henschel
M.F. Carazzolne
A. Pancotti
Richard Landers
George G. Kleiman
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