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Improvement of the thermal stability of the HfO 2 /Si(100) system using a diffusion barrier
Improvement of the thermal stability of the HfO 2 /Si(100) system using a diffusion barrier
2007
D. Weier
M. Schuermann
C. Fluechter
C. Westphal
A. de Sievro
R. Landers
M.F. Carazzolne
A. Pancotti
George G. Kleiman
Keywords:
Annealing (metallurgy)
Thermal diffusivity
Thin film
Composite material
Thermal stability
Sputtering
Materials science
Silicon
Diffusion (business)
Diffusion barrier
Correction
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