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Investigation of the system hafnium/silicon(100) by means of XPS and X-ray photoelectron diffraction (XPD)
Investigation of the system hafnium/silicon(100) by means of XPS and X-ray photoelectron diffraction (XPD)
2006
C. Fluechter
D. Weier
U. Berges
Carsten Westphal
S. Dreiner
M. Schuermann
E. Henschel
M.F. Carazzolne
A. de Siervo
Richard Landers
George G. Kleiman
Keywords:
Materials science
X-ray crystallography
X-ray photoelectron spectroscopy
X-ray
Annealing (metallurgy)
Diffraction
Hafnium
Electron diffraction
Silicon
Analytical chemistry
Correction
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