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Hidehiko Kozawa
Hidehiko Kozawa
Renesas Electronics
Nickel
Optoelectronics
CMOS
Electronic engineering
Contact resistance
4
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5
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0
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Enhancing electrical properties of nickel silicide by using spike anneal as the second rapid thermal anneal
2008
ISSM | International Symposium on Semiconductor Manufacturing
Takuya Futase
Shigenari Okada
Naoto Hashikawa
Takeshi Kamino
Yutaka Inaba
Tetsuo Fujiwara
Tadashi Suzuki
Hirohiko Yamamoto
Hidehiko Kozawa
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Low contact-resistance metallization process for a nickel self-aligned contact of beyond 65nm node CMOS ISSM Paper: PO-O-039
2007
International Symposium on Semiconductor Manufacturing
Takuya Futase
Naoto Hashikawa
Takeshi Hayashi
Hiroshi Tobimatsu
Hirohiko Yamamoto
Hidehiko Kozawa
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Low contact-resistance metallization process for a nickel self-aligned contact of beyond 65nm node CMOS
2007
ISSM | International Symposium on Semiconductor Manufacturing
Takuya Futase
Naoto Hashikawa
Takeshi Hayashi
Hiroshi Tobimatsu
Hirohiko Yamamoto
Hidehiko Kozawa
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Approximation of in-resist image by aerial image with 1/n-times shorter wavelength
2004
Shuji Nakao
Jun Abe
Takashi Okagawa
Akira Imai
Hidehiko Kozawa
Akira Tokui
Kouichirou Tsujita
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