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Tetsuo Fujiwara
Tetsuo Fujiwara
Renesas Electronics
Metallurgy
Engineering
Annealing (metallurgy)
Silicide
Nickel
4
Papers
21
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Pattern-independent, fine-morphology Ni-Pt silicide formation by partial conversion with low metal-consumption ratio
2010
IRPS | International Reliability Physics Symposium
Takuya Futase
Takeshi Kamino
Naoto Hashikawa
Yutaka Inaba
Tetsuo Fujiwara
Hirohiko Yamamoto
H. Tanimoto
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Citations (4)
Improving electrical properties of pure nickel silicide by employing spike anneal as the second rapid thermal anneal
2009
ASMC | Advanced Semiconductor Manufacturing Conference
Takuya Futase
Naoto Hashikawa
Takeshi Kamino
Yutaka Inaba
Tetsuo Fujiwara
Tadashi Suzuki
Hirohiko Yamamoto
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Citations (2)
Spike Annealing as Second Rapid Thermal Annealing to Prevent Pure Nickel Silicide From Decomposing on a Gate
2009
ISSM | International Symposium on Semiconductor Manufacturing
Takuya Futase
Naoto Hashikawa
Takeshi Kamino
Tetsuo Fujiwara
Yutaka Inaba
Tadashi Suzuki
Hirohiko Yamamoto
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Citations (15)
Enhancing electrical properties of nickel silicide by using spike anneal as the second rapid thermal anneal
2008
ISSM | International Symposium on Semiconductor Manufacturing
Takuya Futase
Shigenari Okada
Naoto Hashikawa
Takeshi Kamino
Yutaka Inaba
Tetsuo Fujiwara
Tadashi Suzuki
Hirohiko Yamamoto
Hidehiko Kozawa
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