Old Web
English
Sign In
Acemap
>
authorDetail
>
Jiuk Hur
Jiuk Hur
KLA-Tencor
Wafer
Mask inspection
Engineering
Throughput
Aerial image
5
Papers
3
Citations
0
KQI
Citation Trend
Filter By
Interval:
1900~2024
1900
2024
Author
Papers (5)
Sort By
Default
Most Recent
Most Early
Most Citation
No data
Journal
Conference
Others
Improving mask yield by implementing an advanced mask blank inspection system
2018
Gregg Inderhees
Bill Kalsbeck
Alexander Tan
Paul Chung
Jiuk Hur
Eric Kwon
Min Choo
Wonil Cho
Chan Uk Jeon
Il-Yong Jang
In-Yong Kang
JeongHun Seo
Suein Son
Show All
Source
Cite
Save
Citations (0)
MTO-like reference mask modeling for advanced inverse lithography technology patterns
2017
Jongju Park
Jongin Moon
Suein Son
Dong-Hoon Chung
Byung Gook Kim
Chan Uk Jeon
Patrick LoPresti
Shan Xue
Sonny Wang
Bill Broadbent
Soonho Kim
Jiuk Hur
Min Choo
Show All
Source
Cite
Save
Citations (0)
A novel design-based global CDU metrology for 1X nm node logic devices
2013
Young-Keun Yoon
Dong-Hoon Chung
Min Ho Kim
Jung-Uk Seo
Byung Gook Kim
Chan Uk Jeon
Jiuk Hur
Wonil Cho
Tetsuya Yamamoto
Show All
Source
Cite
Save
Citations (0)
Improving inspectability of sub-2x-nm node masks with complex SRAF
2013
In-Yong Kang
Gi Sung Yoon
Jonghee Lee
Donghoon Paul Chung
Byung Gook Kim
Chan Uk Jeon
Gregg Inderhees
Trent Hutchinson
Wonil Cho
Jiuk Hur
Show All
Source
Cite
Save
Citations (0)
Implementation strategy of wafer-plane and aerial-plane inspection for advanced mask manufacture
2009
Won-Sun Kim
Dong-Hoon Chung
Chan Uk Jeon
Han-Ku Cho
William Huang
John Miller
Gregg Inderhees
Becky Pinto
Jiuk Hur
KiHun Park
Jay Han
Show All
Source
Cite
Save
Citations (3)
1