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KiHun Park
KiHun Park
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Engineering drawing
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4
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4
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New critical dimension uniformity measurement concept based reticle inspection tool
2010
Kangjoon Seo
Munsik Kim
Sang Chul Kim
Jaecheon Shin
Changyeol Kim
John Miller
Aditya Dayal
Trent Hutchinson
KiHun Park
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Implementation strategy of wafer-plane and aerial-plane inspection for advanced mask manufacture
2009
Won-Sun Kim
Dong-Hoon Chung
Chan Uk Jeon
Han-Ku Cho
William Huang
John Miller
Gregg Inderhees
Becky Pinto
Jiuk Hur
KiHun Park
Jay Han
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A pragmatic approach to high sensitivity defect inspection in the presence of mask process variability
2007
Sang Hoon Han
Jinhyung Park
Dong-Hoon Chung
Sang Gyun Woo
Han-Ku Cho
David Kim
Chunlin Chen
KiHun Park
Gregg Inderhees
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Evaluation of litho printability of DRAM contact hole patterns with various programmed defects
2007
Kangjoon Seo
SangIee Lee
HyunYoung Kim
DaeHo Hwang
Sangpyo Kim
Goomin Jeong
Oscar Han
Chunlin Chen
David Yee
EunJi Kim
KiHun Park
NamWook Kim
Sunny Choi
David Kim
Shrinkant Lohokare
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