Old Web
English
Sign In
Acemap
>
authorDetail
>
Bill Kalsbeck
Bill Kalsbeck
KLA-Tencor
Reticle
Blank
Wafer
Extreme ultraviolet lithography
Dark field microscopy
2
Papers
0
Citations
0
KQI
Citation Trend
Filter By
Interval:
1900~2024
1900
2024
Author
Papers (2)
Sort By
Default
Most Recent
Most Early
Most Citation
No data
Journal
Conference
Others
Improving mask yield by implementing an advanced mask blank inspection system
2018
Gregg Inderhees
Bill Kalsbeck
Alexander Tan
Paul Chung
Jiuk Hur
Eric Kwon
Min Choo
Wonil Cho
Chan Uk Jeon
Il-Yong Jang
In-Yong Kang
JeongHun Seo
Suein Son
Show All
Source
Cite
Save
Citations (0)
Dark field technology for EUV and optical mask blank inspection
2017
Qiuping Nie
David Aupperle
Alexander Tan
Bill Kalsbeck
Qiang Zhang
Gregg Inderhees
Show All
Source
Cite
Save
Citations (0)
1