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J. Yu
J. Yu
Chartered Semiconductor Manufacturing
Analytical chemistry
Photoresist
Resist
Plasma
X-ray photoelectron spectroscopy
5
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29
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Physical Failure Analysis Techniques and Studies on Vertical Short Issue of 65nm Devices
2008
P.K. Tan
Z.H. Mai
S.L. Toh
E. Hendarto
Q. Deng
Y.W. Goh
J.L. Cai
Y.Z. Ma
H.B. Lin
L. Zhu
J. Yu
H.L. Li
Q.F. Wang
R. He
H. Tan
J. Lam
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Citations (2)
Effect of Halogen in High-Density Oxygen Plasmas on Photoresist Trimming
2004
Aiche Journal
Chian-Yuh Sin
Bing-Hung Chen
W. L. Loh
J. Yu
P. Yelehanka
Alex See
Lap Chan
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Citations (2)
Resist trimming technique in CF 4 /O 2 high-density plasmas for sub-0.1 µm MOSFET fabrication using 248-nm lithography
2003
Microelectronic Engineering
Chian-Yuh Sin
Bing-Hung Chen
W. L. Loh
J. Yu
Pradeep Ramachandramurthy Yelehanka
Lap Chan
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Citations (5)
Photoresist trimming in oxygen-based high-density plasmas: Effect of HBr and Cl2 addition to CF4/O2 mixtures
2003
Industrial & Engineering Chemistry Research
Chian-Yuh Sin
Bing-Hung Chen
W. L. Loh
J. Yu
Pradeep Ramachandramurthy Yelehanka
Alex See
Lap Chan
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Citations (1)
Resist trimming in high-density CF4/O2 plasmas for sub-0.1 μm device fabrication
2002
Journal of Vacuum Science & Technology B
Chian-Yuh Sin
Bing-Hung Chen
W. L. Loh
J. Yu
P. Yelehanka
Alex See
Lap Chan
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Citations (19)
1