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Kenichi Kawashima
Kenichi Kawashima
Fujitsu
Optics
Electron-beam lithography
Beam (structure)
Cathode ray
Materials science
6
Papers
28
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2024
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Accuracy of exposure during continuous stage movement in a variable shaped vector scanning EB lithography system
1993
Microelectronic Engineering
Takashi Kiuchi
Akio Yamada
Yasushi Takahashi
Yoshihisa Oae
Mitsuhiro Nakano
Junichi Kai
Hiroshi Yasuda
Kenichi Kawashima
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Citations (1)
`NOWEL-2' Variable-Shaped Electron Beam Lithography System for 0.1 µm Patterns with Refocusing and Eddy Current Compensation
1992
Japanese Journal of Applied Physics
Nobuyuki Yasutake
Yasushi Takahashi
Yoshihisa Oae
Akio Yamada
Junichi Kai
Hiroshi Yasuda
Kenichi Kawashima
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Citations (6)
Apparatus and method for exposure using charged particle beams
1992
Hiroshi Yasuda
Yasushi Takahashi
Kiichi Sakamoto
Akio Yamada
Yoshihisa Ose
Junichi Kai
Shunsuke Fueki
Kenichi Kawashima
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Electron Beam Block Exposure : Electron Beam Lithography
1992
Hiroshi Yasuda
Kiichi Sakamoto
Akio Tamada
Kenichi Kawashima
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Electron beam lithography system with new correction techniques
1992
Journal of Vacuum Science & Technology B
Yasushi Takahashi
Akio Yamada
Yoshihisa Oae
Hiroshi Yasuda
Kenichi Kawashima
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Citations (3)
1