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Robert F. Hainsey
Robert F. Hainsey
Intel
Engineering
Wafer
Optics
Lithography
Phase-shift mask
5
Papers
16
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Printability of opaque repairs for DUV EPSM clear defects at sub-half-micrometer design rules
1995
Pei-Yang Yan
Joan McCall
Robert F. Hainsey
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Sub-micron low-k1 imaging characteristics using a DUV printing tool and binary masks
1995
Pei-Yang Yan
Robert F. Hainsey
Jeff Farnsworth
Julaine H. Neff
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Effect of laser mask repair-induced residue and quartz damage in sub-half-micrometer DUV wafer processes
1995
Pei-Yang Yan
Qi-De Qian
Joan McCall
Joseph C. Langston
Yu S. Ger
Joe S. Cho
Robert F. Hainsey
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248-nm DUV MoSiON embedded phase-shifting mask for 0.25 micrometer lithography
1995
Giang T. Dao
Gang Liu
Robert F. Hainsey
Jeff Farnsworth
Yasuo Tokoro
Susumu Kawada
Tsuneo Yamamoto
Nobuyuki Yoshioka
Akira Chiba
Hiroaki Morimoto
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Citations (4)
Ever-increasing role of mask technology in deep submicron lithography
1994
Fu-Chang Lo
Giang T. Dao
Marc Berube
Nelson N. Tam
Robert F. Hainsey
Jeff Farnsworth
Jim DeWitt
Rosanne LaVoy
Susan V. Daugherty
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Citations (1)
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