Ever-increasing role of mask technology in deep submicron lithography

Fu-Chang Lo, Giang Dao, Marc Berube, Nelson Tam, Robert Hainsey,Jeff Farnsworth, Jim Dewitt, Rosanne LaVoy, Susan DaughertyIntel CorporationSanta Clara, CA 95052ABSTRACTThe role of mask technology is going through a major change as silicon technology moves into thesub O.5i,m regime and optical lithography continues to be the predominant approach. Several possible