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A. Shahriar
A. Shahriar
University of Texas at Austin
Materials science
constant voltage
Dielectric
Annealing (metallurgy)
Analytical chemistry
5
Papers
96
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Effects of NH 3 Annealing on High-k HfSiON/HfO 2 Gate Stack Dielectrics
2003
H-J Cho
C. Y. Rang
C. S. Kang
Y. H. Kim
R. Choi
A. Shahriar
C. H. Choi
S. J. Rhee
J. C. Lee
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Citations (1)
Dynamic reliability characteristics of ultra-thin HfO 2
2003
RPS | Reliability Physics Symposium
Young Hee Kim
Katsunori Onishi
C. S. Kang
Rino Choi
Hag Ju Cho
Siddarth A. Krishnan
A. Shahriar
Jack C. Lee
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Citations (11)
Characterization of resistivity and work function of sputtered-TaN film for gate electrode applications
2003
Journal of Vacuum Science & Technology B
Chang Seok Kang
Hag Ju Cho
Young Hee Kim
Rino Choi
Katsunori Onishi
A. Shahriar
Jack C. Lee
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Citations (78)
Hard and soft-breakdown characteristics of ultra-thin HfO 2 under dynamic and constant voltage stress
2002
Young Hee Kim
K. Onishi
C. S. Kang
Rino Choi
Hag Ju Cho
R. Nieh
J. Han
S. Krishnan
A. Shahriar
Jack C. Lee
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Hard and soft-breakdown characteristics of ultra-thin HfO 2 under dynamic and constant voltage stress
2002
Young Hee Kim
Katsunori Onishi
C. S. Kang
Rino Choi
Hag Ju Cho
R. Nieh
J. Han
S. Krishnan
A. Shahriar
Jack C. Lee
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Citations (6)
1