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Eisuke Narita
Eisuke Narita
Extreme ultraviolet lithography
Extreme ultraviolet
Optics
Photomask
Engineering
7
Papers
23
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Defect avoidance for EUV photomask readiness at the 7 nm node
2016
Zhengqing John Qi
Jed H. Rankin
Eisuke Narita
Masayuki Kagawa
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Exploring EUV mask backside defectivity and control methods
2015
Christina Turley
Jed H. Rankin
Louis Kindt
Mark Lawliss
Luke Bolton
Kevin W. Collins
Lin Cheong
Ravi Bonam
Richard Poro
Takeshi Isogawa
Eisuke Narita
Masayuki Kagawa
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EUV photomask defects: what prints, what doesn't, and what is required for HVM
2015
Jed H. Rankin
Zhengqing John Qi
Mark Lawliss
Eisuke Narita
Kazunori Seki
Karen D. Badger
Ravi Bonam
Scott Halle
Christina Turley
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Citations (5)
Defectivity Study on Extreme Ultraviolet Masks
2015
Kazunori Seki
Karen D. Badger
Zhengqing John Qi
Michael S. Hibbs
Jed H. Rankin
Takeshi Isogawa
Eisuke Narita
Shinji Akima
Ravi Bonam
Scott Halle
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EUV mask black border evolution
2014
Christina Turley
Ravi Bonam
Emily Gallagher
Jonathan Grohs
Masayuki Kagawa
Louis Kindt
Eisuke Narita
Steven C. Nash
Yoshifumi Sakamoto
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