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Yashdeep Khopkar
Yashdeep Khopkar
Applied Materials
Electronic engineering
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Mask qualification of a shifted gate contact issue by physical e-beam inspection and high landing energy SEM review : DI: Defect Inspection and Reduction
2019
ASMC | Advanced Semiconductor Manufacturing Conference
John G. Sheridan
Hsiao-Chi Peng
Chih-Chung Huang
Victor Aristov
Hoang Nguyen
Yashdeep Khopkar
A. Jain
Jay Shah
Felix Levitov
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Criticality of Photo Track Monitoring for Lithography Defect Control
2019
ASMC | Advanced Semiconductor Manufacturing Conference
Nathaniel Mowell
Brian Sheumaker
Timothy Han
Joe Chaung
Shail Sanghavi
Yashdeep Khopkar
Felix Levitov
Brandon Bielec
Dave Salvador
Kareem Naguib
Vu Nguyen
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