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W. Mueller
W. Mueller
Qimonda
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Electronic engineering
Trench
Electrical engineering
Physics
2
Papers
12
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A novel cell arrangement enabling Trench DRAM scaling to 40nm and beyond
2007
IEDM | International Electron Devices Meeting
Lars Heineck
Werner Graf
Martin Popp
D. Savignac
Hans-Peter Moll
R. Tews
D. Temmler
Gouri Sankar Kar
J. Schmid
M. Rouhanian
Ines Uhlig
Matthias Goldbach
Erhard Landgraf
Lars Dreeskornfeld
M. Drubba
S. Lukas
D. Weinmann
Wolfgang Roesner
W. Mueller
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Citations (2)
A 58nm Trench DRAM Technology
2006
IEDM | International Electron Devices Meeting
T. Tran
Rolf Weis
A. Sieck
T. Hecht
G. Aichmayr
M. Goldbach
Peng-Fei Wang
A. Thies
G. Wedler
J. Nuetzel
D. Wu
C. Eckl
R. Duschl
T.-M. Kuo
Y.-T. Chiang
W. Mueller
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Citations (10)
1