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Anish Tolia
Anish Tolia
Applied Materials
Metalorganic vapour phase epitaxy
Sputtering
Chemical vapor deposition
Metallizing
Tin
5
Papers
1
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0
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2024
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Ultrathin integrated ion metal plasma titanium and metallorganic titanium nitride liners for sub 0.18 μm W based metallization schemes for >500 MHz microprocessors
1999
Nitin Khurana
Vikram Pavate
Michael Jackson
Tushar Mandrekar
Z. Fang
Anish Tolia
H. Luo
Jason Li
Rod Mosely
Murali Narasimhan
Mei Chang
Fusen E. Chen
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Integrated IMP Ti and MOCVD TiN for 300-mm W barrier and liner for sub-0.18-μm IC processing
1999
Anish Tolia
Marlon Menezes
Jason Li
Michael Jackson
Vikram Pavate
Nitin Khurana
Rod Mosely
Murali Narasimhan
Mei Chang
Fusen E. Chen
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Traitement au plasma pour le remplissage ex-situ de contacts
1999
Lisa Yang
Anish Tolia
Roderick Craig Mosely
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