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C.Y. Yang
C.Y. Yang
United Microelectronics Corporation
Materials science
Analytical chemistry
Electronic engineering
Dopant
Halo
6
Papers
22
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Study on the influence of implant dose rate and amorphization for advanced device characterization
2014
Y. L. Chin
C.Y. Yang
C.K. Chiang
C.C. Chien
N.H. Yang
J. F. Lin
G. Li
J.Y. Wu
S. B. Felch
X. Bai
W. C. Lin
Z.M. Wan
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Impact of gallium implant for advanced CMOS halo/pocket optimization
2014
Y. L. Chin
C.Y. Yang
T.H. Lee
S.W. Yeh
W.F. Chang
S.C. Huang
N.H. Yang
C.C. Chien
J. F. Lin
G. Li
J.Y. Wu
Baonian Guo
Benjamin Colombeau
Thirumal Thanigaivelan
Nilay Pradhan
T. Wu
M. Hou
S. Chen
C. Chung
T. Toh
D. Kouzminov
D. Barrett
Kyu-Ha Shim
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Grain size modulation on impurity doped polysilicon by implant and rapid thermal process tuning and its influence on sheet resistance
2014
IWJT | International Workshop on Junction Technology
C.Y. Yang
C. H. Wei
S. H. Li
Y. L. Chin
R. Liu
C. K. Chiang
C.C. Chien
J. F. Lin
J.Y. Wu
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Reduction of thermal induced pattern loading and device sensitivity by various rapid thermal processing models
2012
IWJT | International Workshop on Junction Technology
C.Y. Yang
C. I. Li
C. H. Wei
T. M. Yang
G. P. Lin
W. J. Chen
Y. L. Chin
R. Liu
M. Chan
C.L. Yang
J.Y. Wu
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Citations (1)
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