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Sharma Varun
Sharma Varun
University of Helsinki
Materials science
Analytical chemistry
Etching (microfabrication)
Dry etching
Titanium nitride
5
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8
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Thermal atomic layer etching of germanium-rich SiGe using an oxidation and “conversion-etch” mechanism
2021
Journal of Vacuum Science and Technology
A. I. Abdulagatov
Sharma Varun
Jessica A. Murdzek
Andrew S. Cavanagh
Steven M. George
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Citations (3)
Thermal Atomic Layer Etching of Aluminum Oxide (Al2O3) Using Sequential Exposures of Niobium Pentafluoride (NbF5) and Carbon Tetrachloride (CCl4): A Combined Experimental and Density Functional Theory Study of the Etch Mechanism
2021
Chemistry of Materials
Sharma Varun
Simon D. Elliott
Tom E. Blomberg
Suvi Haukka
Michael Eugene Givens
Marko Tuominen
Mikko Ritala
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Thermal gas-phase etching of titanium nitride (TiN) by thionyl chloride (SOCl2)
2021
Applied Surface Science
Sharma Varun
Tom E. Blomberg
Suvi Haukka
Cembella Shaun
Michael Givens
Marko Tuominen
Odedra Rajesh
Wes Graff
Mikko Ritala
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位置に基づくサービスにおけるプライバシーに基づくランキング特権モデル【Powered by NICT】
2017
Sharma Varun
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Multi-agent based intrusion prevention and mitigation architecture for software defined networks
2017
Sharma Varun
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