Thermal Atomic Layer Etching of Aluminum Oxide (Al2O3) Using Sequential Exposures of Niobium Pentafluoride (NbF5) and Carbon Tetrachloride (CCl4): A Combined Experimental and Density Functional Theory Study of the Etch Mechanism

Sharma Varun,Simon D. Elliott,Tom E. Blomberg,Suvi Haukka,Michael Eugene Givens,Marko Tuominen,Mikko Ritala

Thermal Atomic Layer Etching of Aluminum Oxide (Al2O3) Using Sequential Exposures of Niobium Pentafluoride (NbF5) and Carbon Tetrachloride (CCl4): A Combined Experimental and Density Functional Theory Study of the Etch Mechanism

2021

Sharma Varun
Simon D. Elliott
Tom E. Blomberg
Suvi Haukka
Michael Eugene Givens
Marko Tuominen
Mikko Ritala

Thermal atomic layer etching (ALEt) of amorphous Al2O3 was performed by alternate exposures of niobium pentafluoride (NbF5) and carbon tetrachloride (CCl4). The ALEt of Al2O3 is observed at tempera...

Keywords:

Carbon tetrachloride
Pentafluoride
Density functional theory
Inorganic chemistry
Etching (microfabrication)
Niobium
Thermal
layer
Amorphous solid
Materials science

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