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Chia-He Chang
Chia-He Chang
Optoelectronics
Materials science
differential
Dopant Activation
characterization
5
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9
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Invited) Characterization of Doping and Activation Processes Using Differential Hall Effect Metrology (DHEM)
2021
Abhijeet Joshi
Gianluca Rengo
Clement Porret
Kun Lin Lin
Chia-He Chang
Bulent M. Basol
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Invited) Characterization of Annealing and Dopant Activation Processes Using Differential Hall Effect Metrology (DHEM)
2021
Abhijeet Joshi
Gianluca Rengo
Clement Porret
Kun Lin Lin
Chia-He Chang
Bulent M. Basol
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Invited) Characterization of Annealing and Dopant Activation Processes Using Differential Hall Effect Metrology (DHEM)
2021
Abhijeet Joshi
Gianluca Rengo
Clement Porret
Kun Lin Lin
Chia-He Chang
Bulent M. Basol
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Nano-Scale Depth Profiles of Electrical Properties of Phosphorus Doped Silicon for Ultra-Shallow Junction Evaluation
2021
IEEE Transactions on Semiconductor Manufacturing
Hung Yuan Chang
YewChung Sermon Wu
Chia-He Chang
Kun Lin Lin
Abhijeet Joshi
Bulent M. Basol
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Location-controlled-grain Technique for Monolithic 3D BEOL FinFET Circuits
2018
IEDM | International Electron Devices Meeting
Chih-Chao Yang
Tung-Ying Hsieh
Po-Tsang Huang
Kuan-Neng Chen
Wan-Chi Wu
Shih-Wei Chen
Chia-He Chang
Chang-Hong Shen
Jia-Min Shieh
Chenming Hu
Meng-Chyi Wu
Wen-Kuan Yeh
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Citations (8)
1