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Invited) Characterization of Annealing and Dopant Activation Processes Using Differential Hall Effect Metrology (DHEM)
Invited) Characterization of Annealing and Dopant Activation Processes Using Differential Hall Effect Metrology (DHEM)
2021
Abhijeet Joshi
Gianluca Rengo
Clement Porret
Kun Lin Lin
Chia-He Chang
Bulent M. Basol
Keywords:
differential
Dopant Activation
characterization
Materials science
Hall effect
Annealing (metallurgy)
Metrology
Optoelectronics
Correction
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