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Jeff Meute
Jeff Meute
IBM
Engineering
Lithography
Resist
Lens (optics)
Optics
5
Papers
14
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The capability of a 1.3-NA μstepper using 3D EMF mask simulations
2006
Will Conley
Jeff Meute
James E. Webb
Douglas S. Goodman
Robert L. Maier
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Effects of airborne molecular contamination on 157-nm resists: AMC friend or foe?
2004
Jeff Meute
Georgia K. Rich
Karen L. Turnquest
Kim Dean
Shashikant Patel
Victoria L. Graffenberg
Michael P. Rodriguez
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Aberration determination in early 157-nm exposure system
2002
Bruce W. Smith
Will Conley
Cesar M. Garza
Jeff Meute
Daniel Miller
Georgia K. Rich
Victoria L. Graffenberg
Kim Dean
Shashikant Patel
Arnie Ford
James Foster
Marco Hugo Petrus Moers
Kevin Cummings
James E. Webb
Paul G. Dewa
Azeddine Zerrade
Susan S. MacDonald
Greg P. Hughes
Peter Dirksen
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Characterization and acid diffusion measurements of new strong acid photoacid generators
2002
Gregory M. Wallraff
Carl E. Larson
Nicolette Fender
Blake Davis
David R. Medeiros
Jeff Meute
William M. Saint Paul Lamanna
Mike J. Parent
T. Robeledo
Gregory Young
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Contamination and degradation of 157-nm stepper optical components: field experience at International SEMATECH
2002
Jeff Meute
Georgia K. Rich
Stefan Hien
Kim Dean
Carolyn Gondran
Julian S. Cashmore
Dominic Ashworth
James E. Webb
Lisa R. Rich
Paul G. Dewa
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