Old Web
English
Sign In
Acemap
>
authorDetail
>
Stefan Hien
Stefan Hien
SEMATECH
Analytical chemistry
Contamination
Resist
Materials science
Stepper
5
Papers
15
Citations
0.00
KQI
Citation Trend
Filter By
Interval:
1900~2024
1900
2024
Author
Papers (5)
Sort By
Default
Most Recent
Most Early
Most Citation
No data
Journal
Conference
Others
Influence of 157-nm specific cleaning procedures on the quality of FIB repair depositions on reticles
2002
Klaus Eisner
Christof Matthias Schilz
Alivina Williams
Stefan Hien
Martin Verbeek
Show All
Source
Cite
Save
Citations (0)
Influence of e-beam-induced contamination on the printability of resist structures at 157-nm exposure
2002
Christof Matthias Schilz
Klaus Eisner
Stefan Hien
Thomas Schleussner
Ralf Ludwig
Armin Semmler
Show All
Source
Cite
Save
Citations (0)
Contamination and degradation of 157-nm stepper optical components: field experience at International SEMATECH
2002
Jeff Meute
Georgia K. Rich
Stefan Hien
Kim Dean
Carolyn Gondran
Julian S. Cashmore
Dominic Ashworth
James E. Webb
Lisa R. Rich
Paul G. Dewa
Show All
Source
Cite
Save
Citations (2)
The Status of 157nm Lithography Development
2001
Journal of Photopolymer Science and Technology
Kim Dean
Chris K. Van Peski
Hyeong-Soo Kim
Stefan Hien
Dah-Chung Owe-Yang
Will Conley
Show All
Source
Cite
Save
Citations (5)
Photoresist outgassing at 157 nm exposure
2001
Stefan Hien
Steve Angood
Dominic Ashworth
Steve Basset
Theodore M. Bloomstein
Kim Dean
Roderick R. Kunz
Daniel Miller
Shashikant Patel
Georgia K. Rich
Show All
Source
Cite
Save
Citations (8)
1