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R. Duru
R. Duru
STMicroelectronics
Materials science
Analytical chemistry
Optics
Chemical-mechanical planarization
Heterojunction bipolar transistor
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450 GHz $f_{\text{T}}$ SiGe:C HBT Featuring an Implanted Collector in a 55-nm CMOS Node
2018
A. Gauthier
J. Borrel
Pascal Chevalier
G. Avenier
A. Montagné
M. Juhel
R. Duru
L. Clement
C. Borowiak
M. Buczko
Christophe Gaquiere
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Investigation of reoxidation mechanisms in nitrided tunnel oxides for Flash memory applications
2011
Microelectronic Engineering
Nicolas Breil
L. Cassagnard
C. Arsac
R. Duru
G. Briend
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Weight-scale, XRR and corona charge method on back-end dielectrics for 65 and 45nm technology nodes
2008
Microelectronic Engineering
D. Fossati
R. Duru
S. Desmercières
J.-C. Royer
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Full Copper Electrochemical Mechanical Planarization (Ecmp) as a Technology Enabler for the 45 and 32nm Nodes
2007
IITC | International Interconnect Technology Conference
M. Mellier
T. Berger
R. Duru
M. Zaleski
M. C. Luche
Maurice Rivoire
C. Goldberg
G Wyborn
K. L. Chang
Y. Wang
V. Ripoche
Stan D. Tsai
M. Thothadri
Wei-Yung Hsu
Liang-Yuh Chen
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Citations (4)
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