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William T. Rericha

Micron Technology

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Motifs à pas réduit par rapport à des caractéristiques photolithographiques

2006
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Pattern with a lesser distance in connection with lithographic features

2006
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Procédé pour la fabrication de circuit intégré utilisant une multiplication de ton

2005
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Factors that determine the optimum reduction factor for wafer steppers

1999
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Lithographic performance at sub-300-nm design rules using a high-NA I-line stepper with optimized NA and (sigma) in conjunction with advanced PSM technology

1994
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