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Craig B. Sager

6

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20

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Lithographic performance at sub-300-nm design rules using a high-NA I-line stepper with optimized NA and (sigma) in conjunction with advanced PSM technology

1994
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Focal plane determination for sub-half micron optical steppers

1993 Microelectronic Engineering
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Exploring the limits of phase-shift lithography: Part I--the alternating shifter

1992
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Citations (4)