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Christiane Jehoul
Christiane Jehoul
Katholieke Universiteit Leuven
Analytical chemistry
Materials science
Dielectric
Dry etching
Etching
4
Papers
22
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Single damascene integration of porous Zirkon TM version 1 low- k dielectric films
2003
Microelectronic Engineering
Stephane Malhouitre
Christiane Jehoul
J. Van Aelst
Herbert Struyf
Sywert Brongersma
L. Carbonell
Ingrid Vos
Gerald Beyer
M. Van Hove
Dana A. Gronbeck
Mike Gallagher
Jeff Calvert
Karen Maex
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Citations (6)
Dependence of the minimal PVD TA(N) sealing thickness on the porosity of Zirkon TM LK Dielectric films
2002
Microelectronic Engineering
Francesca Iacopi
C. Zistl
Christiane Jehoul
Zsolt Tokei
Quoc Toan Le
Arabinda Das
C. Sullivan
Greg Prokopowicz
Dana A. Gronbeck
Mike Gallagher
Jeff Calvert
Karen Maex
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Citations (15)
High rate single substrate polymer etching for multi- chip-modules (MCM) and off-chip-interconnect applications
1992
Microelectronic Engineering
E. Beynen
J. Roggen
R. Vanhoof
G. Brasseur
Christiane Jehoul
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Audio frequency plasma generation reactor configurations for dry etch processing
1991
Microelectronic Engineering
Guy J. J. Brasseur
Pierre Bruneel
Christiane Jehoul
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Citations (1)
1