Audio frequency plasma generation reactor configurations for dry etch processing

Abstract This paper describes the use of audio frequency generated plasmas for advanced etching processes. Following results have been achieved : 1. - Audio frequencies are suited for good definition etching processes. 2. - Distribution of the power over multiple electrodes results in low damage processing. 3. - Magnetic confinement of audio frequency plasmas can easily be achieved using DC-powered solenoids to generate the magnetic field. 4. - High rate silicon nitride, polysilicon and polymer etching can be performed using clean fluorine chemistries.