Sputter with two elongated magnetron

The invention concerns a sputtering installation with two longitudinally placed magnetrons which are arranged adjacent to each other, and each has a target on the upper surface. The aim of the invention is to increase the use of targets in a sputtering installation with two magnetrons which lie adjacent to each other. This aim is attained in that the discharge resistance of a magnetron along the directrix is so homogeneous that a partial discharge resistance of a target point on the directrix has the same magnitude as the partial discharge resistance of another target point on the directrix.