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Timothy A. Brunner

IBM
Massachusetts Institute of Technology

80

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1549

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Intra-field overlay correction for illumination based distortion

2015 Proceedings of SPIE
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Monitoring process-induced focus errors using high-resolution flatness metrology

2015 ASMC | Advanced Semiconductor Manufacturing Conference
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Layout optimization method to equalize the best-focus position of different patterns

2014 Journal of Micro-nanolithography Mems and Moems
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Ion beams, thermal processes and lithographic challenges

2014
- Harry J. Levinson
- Timothy A. Brunner
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Scatterometry-based on-product focus measurement and monitoring

2013 ASMC | Advanced Semiconductor Manufacturing Conference
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Characterization of wafer geometry and overlay error on silicon wafers with nonuniform stress

2013 Journal of Micro-nanolithography Mems and Moems
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Dose-focus monitor technique using CD-SEM and application to local variation analysis

2012 Proceedings of SPIE
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Dose-focus monitor technique using a critical-dimension scanning electron microscope and its application to local variation analysis

2012 Journal of Micro-nanolithography Mems and Moems
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Insertion strategy for EUV lithography

2012 Proceedings of SPIE
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Predicting substrate-induced focus error

2010 Journal of Micro-nanolithography Mems and Moems
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