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John C. Arnold

IBM

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Exploration of pillar local CDU improvement options for AI applications (Conference Presentation)

2020
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Electrical validation of the integration of 193i and DSA for sub-20nm metal cut patterning

2019
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Defect detection strategies and process partitioning for single-expose EUV patterning

2018 Journal of Micro-nanolithography Mems and Moems
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Self-aligned blocking integration demonstration for critical sub-30nm pitch Mx level patterning with EUV self-aligned double patterning

2018
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Self-aligned blocking integration demonstration for critical sub-30-nm pitch Mx level patterning with EUV self-aligned double patterning

2018 Journal of Micro-nanolithography Mems and Moems
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Defect detection strategies and process partitioning for SE EUV patterning (Conference Presentation)

2018
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Introduction of pre-etch deposition techniques in EUV patterning

2018
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Single-expose patterning development for EUV lithography

2017 Proceedings of SPIE
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Directed self-assembly patterning strategies for phase change memory applications

2017 Proceedings of SPIE
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Ultrathin extreme ultraviolet patterning stack using polymer brush as an adhesion promotion layer

2017 Journal of Micro-nanolithography Mems and Moems
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