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Hiroyuki Hasegawa
Hiroyuki Hasegawa
Mitsubishi
Moisture
Analytical chemistry
Epitaxy
Electronic engineering
Semiconductor device fabrication
5
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2024
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Semiconductor manufacturing processes and semiconductor manufacturing equipment
2001
Hiroyuki Hasegawa
Tomonori Yamaoka
Yoshio Ishihara
Hiroshi Masusaki
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Semiconductor manufacturing processes
2001
Hiroyuki Hasegawa
Yoshio Ishihara
Hiroshi Masusaki
Tomonori Yamaoka
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Improvement in throughput of silicon epitaxial process by using in-line moisture monitoring
2000
ISSM | International Symposium on Semiconductor Manufacturing
Hiroyuki Hasegawa
Tomonori Yamaoka
Manabu Hamano
Yoshio Ishihara
Takayuki Satoh
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CVD-Einrichtung zum Bilden eines Halbleiterfilms auf einem Wafer und Verfahren zum Beurteilen von Wartungszeiten einer CVD- Einrichtung
2000
Hiroyuki Hasegawa
Yoshio Ishihara
Hiroshi Masusaki
Takayuki Satou
Katsumasa Suzuki
Hiroki Tokunaga
Tomonori Yamaoka
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結晶成長用サセプタとこれを用いた結晶成長装置、およびエピタキシャル・ウェーハとその製造方法
1999
Manabu Hamano
Hiroyuki Hasegawa
Hiroshi Shinyashiki
Kazuo Tezuka
Tomonori Yamaoka
tomonori yamaoka
kazuo tezuka
hirosi sinyasiki
gaku hamano
hiroyuki hasegawa
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