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Didier Pique
Didier Pique
KLA-Tencor
Analytical chemistry
Dielectric
Silicon
Metalorganic vapour phase epitaxy
Annealing (metallurgy)
4
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46
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Composition and Growth Kinetics of the Interfacial Layer for MOCVD HfO2 Layers on Si Substrates
2004
Journal of The Electrochemical Society
S. Van Elshocht
Matty Caymax
S. De Gendt
T. Conard
Jasmine Petry
L. Date
Didier Pique
M. Heyns
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Citations (29)
Bulk Properties of MOCVD-Deposited HfO2 Layers for High k Dielectric Applications
2004
Journal of The Electrochemical Society
Sven Van Elshocht
Mikhail R. Baklanov
Bert Brijs
Richard Carter
Matty Caymax
L. Carbonell
Martine Claes
Thierry Conard
Vincent Cosnier
Lucien Date
Stefan De Gendt
J. Kluth
Didier Pique
Olivier Richard
Danielle Vanhaeren
Guy Vereecke
T. Witters
Chao Zhao
Marc Heyns
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Citations (16)
Gate Dielectrics for High Performance and Low Power CMOS SoC Applications
2002
ESSDERC | European Solid-State Device Research Conference
F.N. Cubaynes
C.J.J. Dachs
C. Detcheverry
A. Zegers
V. C. Venezia
Jurriaan Schmitz
P.A. Stolk
M. Jurczak
Kirklen Henson
Robin Degraeve
A. Rothschild
T. Conard
Jasmine Petry
M. Da Rold
Marc Schaekers
Gonçal Badenes
L. Date
Didier Pique
Husam N. Alshareef
Robert W. Murto
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In-line electrical characterization of ultrathin gate dielectric films
2002
ASMC | Advanced Semiconductor Manufacturing Conference
F.N. Cubaynes
Sophie Passefort
Kwame Eason
Xiafang Zhang
Lucien Date
Didier Pique
Thierry Conard
Aude Rothschild
Marc Schaekers
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