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kento misima
kento misima
Atomic layer deposition
interfacial reaction
Computer science
Artificial intelligence
X-ray photoelectron spectroscopy
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TaO_x層挿入によるHfO_2/Ge界面反応制御(ゲート絶縁薄膜,容量膜,機能膜及びメモリ技術)
2012
SDM | SIAM International Conference on Data Mining
hideki murakami
kento misima
teruo oota
kuniaki hasimoto
seiitirou higasi
seiiti miyazaki
Hideki Murakami
Kento Mishima
Akio Ohta
Kuniaki Hashimoto
Seiichiro Higashi
Seiichi Miyazaki
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Ge(100)表面の極薄TiOxキャッピングによるHfO2原子層堆積/熱処理時の界面反応制御
2011
hideki murakami
tomohiro fuzioka
teruo oota
kento misima
seiitirou higasi
seiiti miyazaki
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Ge(100)表面の極薄TiO_xキャッピングによるHfO_2原子層堆積/熱処理時の界面反応制御(ゲート絶縁薄膜,容量膜,機能膜及びメモリ技術)
2011
SDM | SIAM International Conference on Data Mining
hideki murakami
tomohiro fuzioka
teruo oota
kento misima
seiitirou higasi
seiiti miyazaki
Hideki Murakami
Tomohiro Fujioka
Akio Ohta
Kento Mishima
Seiichiro Higashi
Seiichi Miyazaki
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