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Thomas Faure
Thomas Faure
GlobalFoundries
Electronic engineering
Engineering
Lithography
Critical dimension
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2
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5
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7-nm e-beam resist sensitivity characterization
2016
Amy Zweber
Yusuke Toda
Yoshifumi Sakamoto
Thomas Faure
Jed H. Rankin
Steven Nash
Masayuki Kagawa
Michael Fahrenkopf
Takeshi Isogawa
Richard Wistrom
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Citations (4)
Development of a new high transmission phase shift mask technology for 10 nm logic node
2016
Thomas Faure
Yoshifumi Sakamoto
Yusuke Toda
Karen D. Badger
Kazunori Seki
Mark Lawliss
Takeshi Isogawa
Amy Zweber
Masayuki Kagawa
Richard Wistrom
Yongan Xu
Granger Lobb
Ramya Viswanathan
Lin Hu
Yukio Inazuki
Kazuhiro Nishikawa
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