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Hua Zhang
Hua Zhang
SEMATECH
Wafer
Lithography
Engineering
Pullback
Optics
4
Papers
16
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Optical proximity correction: a detail comparison of techniques and their effectiveness
1998
Microelectronic Engineering
Hua Zhang
J. Morrow
F.M. Schellenberg
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SEMATECH J111 project: OPC validation
1998
Franklin M. Schellenberg
Hua Zhang
Jim Morrow
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Application of a develop end point detector as a timely and cost-effective alternative to using an SEM for CD measurement in production photolithography
1996
Dimitri L. Velikov
Mark Goldman
Dee Hester
Alan W. Kukas
Clifford H. Takemoto
Ken Goetz
Hua Zhang
Linard Karklin
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Evaluation of OPC efficacy
1996
Franklin M. Schellenberg
Hua Zhang
Jim Morrow
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Citations (5)
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