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Brian E. Maxwell

Massachusetts Institute of Technology

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PLASMA-DEPOSITED SILYLATION RESIST FOR 193 NM LITHOGRAPHY

1996 Applied Physics Letters
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Plasma‐deposited silylation resist for 193 nm lithography

1996 Journal of Vacuum Science & Technology B
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All-dry resist processes for 193-nm lithography

1995
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Profile control in dry development of high‐aspect‐ratio resist structures

1995 Journal of Vacuum Science & Technology B
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