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Ichihara Reika
Ichihara Reika
Materials science
Optoelectronics
High-κ dielectric
Metal gate
Electronic engineering
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メモリ動作中の自発分極とトラップ電荷の直接抽出に基づくHfO_2FeFETにおけるV_th窓と信頼性の再検討【JST・京大機械翻訳】
2020
Ichihara Reika
Suzuki Kunifumi
Kusai Haruka
Ariyoshi Keiko
Akari Keisuke
Takano Keisuke
Matsuo Kazuhiro
Kamiya Yuta
Takahashi Kota
Miyazawa Hidenori
Kamimuta Yuuichi
Sakuma Kiwamu
Saitoh Masumi
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テラビットスケール高密度応用のためのAgイオンメモリセル技術【JST・京大機械翻訳】
2019
Fujii Shosuke
Ichihara Reika
Konno Takuya
Yamaguchi Marina
Seki Harumi
Tanaka Hiroki
Zhao DanDan
Yoshimura Yoko
Saitoh Masumi
Koyama Masato
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Impact of Tantalum Composition in TaCx/HfSiON Gate Stack on Device Performance of Aggressively Scaled CMOS Devices with SMT and Strained CESL
2008
Symposium on VLSI Technology
Goto Masakazu
Tatsumura Kosuke
Kawanaka Shigeru
Nakajima Kazuaki
Ichihara Reika
Yoshimizu Yasuhito
Onoda Hiroyuki
Nagatomo Koji
Sasaki Toshiyuki
Fukushima Takashi
Nomachi Akiko
Inumiya Seiji
Aoyama Tomonori
Koyama Masato
Toyoshima Yoshiaki
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Effect of metal-gate/high-k on characteristics of MOSFETs for 32nm CMOS and beyond
2007
Koyama Masato
Koike Masahiro
Kamimuta Yuuichi
Suzuki Masamichi
Tatsumura Kosuke
Tsuchiya Yoshinori
Ichihara Reika
Goto Masakazu
Nagatomo Koji
Azuma Atsushi
Kawanaka Shigeru
Nakajima Kazuaki
Sekine Katsuyuki
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