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Effect of metal-gate/high-k on characteristics of MOSFETs for 32nm CMOS and beyond
Effect of metal-gate/high-k on characteristics of MOSFETs for 32nm CMOS and beyond
2007
Koyama Masato
Koike Masahiro
Kamimuta Yuuichi
Suzuki Masamichi
Tatsumura Kosuke
Tsuchiya Yoshinori
Ichihara Reika
Goto Masakazu
Nagatomo Koji
Azuma Atsushi
Kawanaka Shigeru
Nakajima Kazuaki
Sekine Katsuyuki
Keywords:
High-κ dielectric
Metal gate
Gate dielectric
Gate oxide
Electronic engineering
MOSFET
Time-dependent gate oxide breakdown
CMOS
Materials science
Optoelectronics
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