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Shang Feng Weng
Shang Feng Weng
United Microelectronics Corporation
Lithography
Process window
Optics
Optical proximity correction
optical intensity
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Practical lithography hotspot identification using mask process model
2019
Pai Chi Chen
Chain Ting Huang
Shang Feng Weng
Yung-Feng Cheng
Young Ham
Colbert Lu
Michael Green
Mohamed Ramadan
Heng-Jen Lee
Chris Progler
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Mask process correction for optical weak pattern improvement
2019
Pai Chi Chen
Chain Ting Huang
Shang Feng Weng
Yung-Feng Cheng
Kazunori Nagai
Kenji Kono
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